Files include the data presented in the manuscript entitled: Hydrogen gas sensing performance of p-type copper and titanium mixed oxides: influence of the elemental composition and the annealing temperature by E. Mankowska and M. Mazur.
Fig. 4. Diffractograms of thin films of a) TiOx, b) (Cu0.23Ti0.77)Ox, c) (Cu0.41Ti0.59)Ox, d) (Cu0.56Ti0.44)Ox, e) (Cu0.77Ti0.23)Ox and f) CuxO after deposition and after annealing.
Fig. 6. a) Summary of the size of selected TiO2 crystallites depending on the amount of copper in the thin film and annealing temperature, b) crystallization temperature of anatase depending on the elemental composition of the thin film
Fig. 7. Summary of the size of selected crystallites depending on the amount of copper in the thin film and the annealing temperature.
Fig. 8. Sensor response of thin films with various elemental composition annealed at 200°C, 250°C and 300°C and measured at various operating temperatures.
Fig. 9. The dynamic of resistance changes of thin films a) TiOx, b) (Cu0.41Ti0.59)Ox, c) (Cu0.56Ti0.44)Ox, d) (Cu0.77Ti0.23)Ox and e) CuxO to 100, 200, 500 and 1000 ppm of H2 measured at operating temperatures from 200 to 300°C.
Fig. 10. Sensor response to 100 ÷ 1000 ppm of hydrogen of copper and titanium oxides based thin films annealed at 300°C, measured at operating temperature of a) 250°C and b) 300°C.
Fig. 11. Repeatability test of (Cu0.77Ti0.23)Ox and CuxO thin films annealed at 300°C and measured at 250°C upon exposure to 200 ppm of H2.
Fig. 12. XPS spectra of Ti2p region of TiOx thin film after annealing at 200°C and after exposition to hydrogen for 15 min and 60 min.
Fig. 13. XPS spectra of a-c) Cu2p and d-f) Cu LMM region of thin film (Cu0.56Ti0.44)Ox, (Cu0.77Ti0.23)Ox, and CuxO, respectively.
(2026-01)
