Files include the data presented in the manuscript entitled: "Investigation of gasochromic properties in tungsten oxide thin films prepared by glancing angle deposition using electron beam evaporation" by Weichbrodt et al. (https://doi.org/10.1364/AO.574156).
Fig. 2a presents X-ray diffraction results of as-deposited WO3 thin films deposited with the use of GLAD technique at various angles
Fig. 2b presents X-ray diffraction results of WO3 thin films deposited with the use of GLAD technique at various angles and annealed at 400C
Fig. 2c presents Raman spectroscopy measurements results of as-deposited WO3 thin films deposited with the use of GLAD technique at various angles
Fig. 2d presents Raman spectroscopy measurements results of WO3 thin films deposited with the use of GLAD technique at various angles and annealed at 400C
Fig. 6 presents normalized transmission change at 900 nm shown upon exposure to hydrogen at concentrations ranging from 50 to 1000 ppm for as-deposited and annealed WO3 thin films prepared using the GLAD technique at an angle of: (a) 0, (b) 60, (c) 70, (d) 80, (e) 85, and (f) 88 degrees. Measurements were done using experimental setup for gasochromic research, including Ocean Optics QE65000 spectrophotometer and DH-BAL 2000 light source.
Fig. 7ab presents measurements results of WO3 thin films exposed to 1000 ppm of H2: (a) normalized transmission at 900 nm for nanocrystalline WO3 thin films deposited at various angles, and (b) comparison of stability tests for thin films deposited at an angle of 0 and 88 degrees. Measurements were done using experimental setup for gasochromic research, including Ocean Optics QE65000 spectrophotometer and DH-BAL 2000 light source.
